PURITY AND MORPHOLOGY OF ALUMINUM FILMS

被引：13

作者：

DHERE, NG

ARSENIO, TP

PATNAIK, BK

机构：

[1] INST MIL ENGENHARIA,DEPT CIEN MAT,PRACA GEN TIBURCIO,RIO DE JANEIRO,BRAZIL

[2] PONTIFICIA UNIV CATOLICA,DEPT FIS,RIO DE JANEIRO,BRAZIL

来源：

THIN SOLID FILMS | 1975年 / 30卷 / 02期

关键词：

D O I：

10.1016/0040-6090(75)90091-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：267 / 279

页数：13

共 15 条

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RAO, PV ;

PRICE, RE ;

MARK, H ;

FINK, RW .

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[3]

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[4]

BLACK JR, 1970, NBS337 SPEC PUBL, P398

[5]

DHERE NG, 1975, METALURGIA, V31, P227

[6]

GLANG R, 1970, HDB THIN FILM TECHNO, P1

[7] DEPOSITION OF ALUMINUM FROM AN ELECTRON-BEAM SOURCE [J].

GRAPER, EB .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01) :33-&

[8] PROTON-INDUCED X-RAY CROSS-SECTIONS FOR SELECTED ELEMENTS FE TO AS AND APPLICATIONS OF X-RAY ANALYSIS TO SEMICONDUCTOR SYSTEMS [J].

GRAY, TJ ;

LEAR, R ;

DEXTER, RJ ;

SCHWETTMANN, FN ;

WIEMER, KC .

THIN SOLID FILMS, 1973, 19 (01) :103-119

[9]

GUIMARAES JRC, TO BE PUBLISHED

[10]

HOLDEN J, 1969, ELECTRON ENG OCT, P33

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