BARRIER WIDTH DEPENDENCE OF LEAKAGE CURRENTS IN INGAAS/GAAS MULTIPLE QUANTUM-WELL P-I-N-DIODES

被引:7
作者
DAVID, JPR
GREY, R
PATE, MA
CLAXTON, PA
WOODHEAD, J
机构
[1] Department of Electronic and Electrical Engineering, University of Sheffield, Sheffield, S1 3JD, Mappin Street
关键词
III-V SEMICONDUCTORS; STRAINED LAYER SEMICONDUCTORS; DIODE LEAKAGE CURRENTS;
D O I
10.1007/BF02657893
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A range of InGaAs/GaAs strained layer multiple quantum well pin diode structures with different barrier dimensions has been grown and characterized. High quality low leakage structures (< 2 x 10(-4) A/cm2 @ 0.9 V(BD) with a high degree of strain (approximately 2%) have been produced. An important factor affecting the leakage for a fixed well composition and dimension is found to be the barrier width.
引用
收藏
页码:295 / 297
页数:3
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