A range of InGaAs/GaAs strained layer multiple quantum well pin diode structures with different barrier dimensions has been grown and characterized. High quality low leakage structures (< 2 x 10(-4) A/cm2 @ 0.9 V(BD) with a high degree of strain (approximately 2%) have been produced. An important factor affecting the leakage for a fixed well composition and dimension is found to be the barrier width.