DISORDER-INDUCED RAMAN-SCATTERING IN NISI2

被引:28
作者
LI, F
LUSTIG, N
KLOSOWSKI, P
LANNIN, JS
机构
[1] Department of Physics, Penn State University, University Park
来源
PHYSICAL REVIEW B | 1990年 / 41卷 / 14期
关键词
D O I
10.1103/PhysRevB.41.10210
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Disorder-induced Raman scattering (DIRS) has been observed in epitaxial films of NiSi2 on (111) Si. The DIRS, which is found to have primarily A-like symmetry, is attributed to Si-site disorder. A comparison with lower-resolution inelastic-neutron-scattering measurements on polycrystalline films suggests that the Raman spectra represent a coupling-parameter-weighted density of states. © 1990 The American Physical Society.
引用
收藏
页码:10210 / 10213
页数:4
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