EMISSION CHARACTERISTICS AND STABILITY OF A HELIUM FIELD-ION SOURCE

被引：10

作者：

HORIUCHI, K

ITAKURA, T

ISHIKAWA, H

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.584328

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：937 / 940

页数：4

共 12 条

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[3]

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[4]

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[6]

Levi-Setti R., 1974, Scanning Electron Microscopy 1974, P125

[7]

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[8] FINE-FOCUS ION-BEAMS WITH FIELD-IONIZATION [J].

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[9] ANGULAR INTENSITY OF A GAS-PHASE FIELD-IONIZATION SOURCE [J].

ORLOFF, J ;

SWANSON, LW .

JOURNAL OF APPLIED PHYSICS, 1979, 50 (09) :6026-6027

[10] STUDY OF A FIELD-IONIZATION SOURCE FOR MICROPROBE APPLICATIONS [J].

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