RAMAN-STUDY ON THE VARIATION OF THE SILICON NETWORK OF A-SI-H

被引：46

作者：

HISHIKAWA, Y

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 08期

关键词：

D O I：

10.1063/1.339365

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3150 / 3155

页数：6

共 28 条

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