INSITU OBSERVATION ON ELECTRON-BEAM INDUCED CHEMICAL VAPOR-DEPOSITION BY AUGER-ELECTRON SPECTROSCOPY

被引:12
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MATSUI, S
MORI, K
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10.1063/1.98343
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O59 [应用物理学];
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页码:646 / 648
页数:3
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[1]   ELECTRON-BEAM FABRICATION OF 80-A METAL STRUCTURES [J].
BROERS, AN ;
MOLZEN, WW ;
CUOMO, JJ ;
WITTELS, ND .
APPLIED PHYSICS LETTERS, 1976, 29 (09) :596-598
[2]   PHOTODEPOSITION OF METAL-FILMS WITH ULTRAVIOLET-LASER LIGHT [J].
EHRLICH, DJ ;
OSGOOD, RM ;
DEUTSCH, TF .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (01) :23-32
[3]   A SIMPLE MODEL FOR DEPENDENCE OF AUGER INTENSITIES ON SPECIMEN THICKNESS [J].
GALLON, TE .
SURFACE SCIENCE, 1969, 17 (02) :486-&
[4]   NEW SELECTIVE DEPOSITION TECHNOLOGY BY ELECTRON-BEAM INDUCED SURFACE-REACTION [J].
MATSUI, S ;
MORI, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01) :299-304
[5]   AUGER-ELECTRON SPECTROSCOPY [J].
RIVIERE, JC .
CONTEMPORARY PHYSICS, 1973, 14 (06) :513-539
[6]   QUANTITATIVE AUGER-ELECTRON SPECTROSCOPY AND ELECTRON RANGES [J].
SEAH, MP .
SURFACE SCIENCE, 1972, 32 (03) :703-&