PHOTODEPOSITION OF METAL-FILMS WITH ULTRAVIOLET-LASER LIGHT

[1] LASER CHEMICAL VAPOR-DEPOSITION OF METALS AND INSULATORS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 431 - 431

[2] CONNOR J, 1977, AM CHEM SOC, V93, P5213

[3] OPTICAL REFLECTANCE TECHNIQUE FOR OBSERVATIONS OF SUBMONOLAYER ADSORBED FILMS [J]. OPTICS LETTERS, 1981, 6 (11) : 563 - 565

[4] LASER PHOTODEPOSITION OF METAL-FILMS WITH MICROSCOPIC FEATURES [J]. APPLIED PHYSICS LETTERS, 1979, 35 (02) : 175 - 177

[5] EHRLICH DJ, 1980, APPL PHYS LETT, V36, P916, DOI 10.1063/1.91366

[6] EHRLICH DJ, 1981, J ELECTROCHEM SOC, V128, P2039, DOI 10.1149/1.2127793

[7] UV PHOTOLYSIS OF VANDERWAALS MOLECULAR FILMS [J]. CHEMICAL PHYSICS LETTERS, 1981, 79 (02) : 381 - 388

[8] EHRLICH DJ, 1981, APPL PHYS LETT, V39, P957, DOI 10.1063/1.92624

[9] LASER MICROPHOTOCHEMISTRY FOR USE IN SOLID-STATE ELECTRONICS [J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1980, 16 (11) : 1233 - 1243

[10] ONE-STEP REPAIR OF TRANSPARENT DEFECTS IN HARD-SURFACE PHOTOLITHOGRAPHIC MASKS VIA LASER PHOTODEPOSITION [J]. ELECTRON DEVICE LETTERS, 1980, 1 (06): : 101 - 103

[1] LASER CHEMICAL VAPOR-DEPOSITION OF METALS AND INSULATORS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 431 - 431

[2] CONNOR J, 1977, AM CHEM SOC, V93, P5213

[3] OPTICAL REFLECTANCE TECHNIQUE FOR OBSERVATIONS OF SUBMONOLAYER ADSORBED FILMS [J]. OPTICS LETTERS, 1981, 6 (11) : 563 - 565

[4] LASER PHOTODEPOSITION OF METAL-FILMS WITH MICROSCOPIC FEATURES [J]. APPLIED PHYSICS LETTERS, 1979, 35 (02) : 175 - 177

[5] EHRLICH DJ, 1980, APPL PHYS LETT, V36, P916, DOI 10.1063/1.91366

[6] EHRLICH DJ, 1981, J ELECTROCHEM SOC, V128, P2039, DOI 10.1149/1.2127793

[7] UV PHOTOLYSIS OF VANDERWAALS MOLECULAR FILMS [J]. CHEMICAL PHYSICS LETTERS, 1981, 79 (02) : 381 - 388

[8] EHRLICH DJ, 1981, APPL PHYS LETT, V39, P957, DOI 10.1063/1.92624

[9] LASER MICROPHOTOCHEMISTRY FOR USE IN SOLID-STATE ELECTRONICS [J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1980, 16 (11) : 1233 - 1243

[10] ONE-STEP REPAIR OF TRANSPARENT DEFECTS IN HARD-SURFACE PHOTOLITHOGRAPHIC MASKS VIA LASER PHOTODEPOSITION [J]. ELECTRON DEVICE LETTERS, 1980, 1 (06): : 101 - 103