LARGE AREA DOPING TECHNIQUE USING AN ION-SOURCE OF RF DISCHARGE WITH MAGNETIC-FIELD

被引:12
作者
YOSHIDA, A [1 ]
KITAGAWA, M [1 ]
SETSUNE, K [1 ]
HIRAO, T [1 ]
机构
[1] MATSUSHITA ELECT IND CO LTD, CENT RES LABS, OSAKA 570, JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1988年 / 27卷 / 07期
关键词
D O I
10.1143/JJAP.27.L1355
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:L1355 / L1357
页数:3
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