PHOTOELECTRIC WORK FUNCTION AND ELECTRICAL-RESISTANCE MEASUREMENTS ON IRON, COBALT AND NICKEL FILMS ANNEALED AT TEMPERATURES BETWEEN 77-K AND 478-K

被引：16

作者：

HERAS, JM

ALBANO, EV

机构：

来源：

THIN SOLID FILMS | 1983年 / 106卷 / 04期

关键词：

D O I：

10.1016/0040-6090(83)90339-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：275 / 284

页数：10

共 41 条

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