ON THE INITIAL PHASE OF NATIVE OXIDE FORMATION ON SI(111)

被引：8

作者：

FIORI, C

DEVINE, RAB

机构：

来源：

SOLID STATE COMMUNICATIONS | 1984年 / 51卷 / 06期

关键词：

D O I：

10.1016/0038-1098(84)90131-5

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：441 / 443

页数：3

共 17 条

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DEVINE, RAB .

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[6]

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[8]

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[9] DECOMPOSITION OF SIOX FILMS DUE TO INTERNAL-STRESS [J].

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PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1983, 118 (01) :239-244

[10] VIBRATIONAL STUDY OF THE INITIAL-STAGES OF THE OXIDATION OF SI(111) AND SI(100) SURFACES [J].

IBACH, H ;

BRUCHMANN, HD ;

WAGNER, H .

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