ENHANCEMENT OF SLIDING LIFE OF MOS2 FILMS DEPOSITED BY COMBINING SPUTTERING AND HIGH-ENERGY ION-IMPLANTATION

被引：27

作者：

CHEVALLIER, J ^{[1
]}

OLESEN, S ^{[1
]}

SORENSEN, G ^{[1
]}

GUPTA, B ^{[1
]}

机构：

[1] INDIAN INST TECHNOL,NEW DELHI 110016,INDIA

来源：

关键词：

D O I：

10.1063/1.96645

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：876 / 877

页数：2

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