RANGE PROFILES OF 10 TO 390 KEV IONS (29-LESS-THAN-OR-EQUAL-TO-Z1-LESS-THAN-OR-EQUAL-TO-83) IMPLANTED INTO AMORPHOUS-SILICON

被引:35
作者
FICHTNER, PFP [1 ]
BEHAR, M [1 ]
OLIVIERI, CA [1 ]
LIVI, RP [1 ]
DESOUZA, JP [1 ]
ZAWISLAK, FC [1 ]
BIERSACK, JP [1 ]
FINK, D [1 ]
机构
[1] HAHN MEITNER INST KERNFORSCH BERLIN GMBH,D-1000 BERLIN 39,FED REP GER
关键词
D O I
10.1016/0168-583X(87)90491-5
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:481 / 487
页数:7
相关论文
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