THE EFFECT OF INERT-GAS PLASMA EXPOSURE ON THE SURFACE-STRUCTURE OF HYDROGENATED AMORPHOUS-SILICON (A-SI-H)

被引：8

作者：

COLLINS, RW

TUCKERMAN, CJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 05期

关键词：

D O I：

10.1116/1.574074

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2343 / 2349

页数：7

共 24 条

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Collins R. W., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V617, P62, DOI 10.1117/12.961074

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