ON THE DETERMINATION OF DEEP LEVEL CONCENTRATION PROFILES BY DLTS MEASUREMENTS

被引:11
作者
MAASS, K [1 ]
IRMSCHER, K [1 ]
KLOSE, H [1 ]
机构
[1] ACAD SCI GDR,ZENTRUM WISSENSCH GERATEBAU,DDR-1199 BERLIN,GER DEM REP
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1985年 / 91卷 / 02期
关键词
D O I
10.1002/pssa.2210910238
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:667 / 675
页数:9
相关论文
共 10 条
[1]  
BRICE DK, 1975, ION IMPLANTATION RAN, V1
[2]  
BURENKOV AF, 1980, TABLITSY PARAMETROV
[3]   ELECTRIC-FIELD ENHANCED ELECTRON-EMISSION FROM GOLD ACCEPTOR LEVEL AND A-CENTER IN SILICON [J].
IRMSCHER, K ;
KLOSE, H ;
MAASS, K .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1983, 75 (01) :K25-K28
[4]   HYDROGEN-RELATED DEEP LEVELS IN PROTON-BOMBARDED SILICON [J].
IRMSCHER, K ;
KLOSE, H ;
MAASS, K .
JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1984, 17 (35) :6317-6329
[5]   INFLUENCE OF DEBYE LENGTH ON C-V MEASUREMENTS OF DOPING PROFILES [J].
JOHNSON, WC ;
PANOUSIS, PT .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1971, ED18 (10) :965-&
[6]   FAST CAPACITANCE TRANSIENT APPARATUS - APPLICATION TO ZNO AND O CENTERS IN GAP PARANORMAL JUNCTIONS [J].
LANG, DV .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (07) :3014-3022
[7]  
LANG DV, 1974, J APPL PHYS, V45, P2023
[8]   DOUBLE CORRELATION TECHNIQUE (DDLTS) FOR ANALYSIS OF DEEP LEVEL PROFILES IN SEMICONDUCTORS [J].
LEFEVRE, H ;
SCHULZ, M .
APPLIED PHYSICS, 1977, 12 (01) :45-53
[10]   A SYSTEM FOR MEASURING DEEP-LEVEL SPATIAL CONCENTRATION DISTRIBUTIONS [J].
WANG, KL .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (01) :449-453