A microwave plasma based on a capacitively coupled microwave plasma was developed and several diagnostical parameters were evaluated. This plasma was sustained at powers as low as 25 W with He as the plasma gas. Rotational (2500 K) and excitation (4500 K) temperatures were determined from N2+ and Fe, respectively. The rotational and excitation temperatures were independent of power (35-115 W), radial (- 3 to + 3 mm) and axial (1-7 mm) positions, and the He plasma gas flow-rate (4-8 l min-1). The excitation temperature decreased slightly with plasma gas flow-rate between 3 and 4 l min-1 while the rotational temperature remained constant. The electron density (4 X 10(14) cm-3) also remained unchanged with both power and radial distances.
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UNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCEUNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCE
ALANDARI, J
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DIAMY, AM
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UNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCEUNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCE
DIAMY, AM
;
GUILLERME, JM
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UNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCEUNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCE
GUILLERME, JM
;
LEGRAND, JC
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UNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCEUNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCE
LEGRAND, JC
;
BENAIM, RI
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机构:
UNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCEUNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCE
机构:
UNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCEUNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCE
ALANDARI, J
;
DIAMY, AM
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h-index: 0
机构:
UNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCEUNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCE
DIAMY, AM
;
GUILLERME, JM
论文数: 0引用数: 0
h-index: 0
机构:
UNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCEUNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCE
GUILLERME, JM
;
LEGRAND, JC
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h-index: 0
机构:
UNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCEUNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCE
LEGRAND, JC
;
BENAIM, RI
论文数: 0引用数: 0
h-index: 0
机构:
UNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCEUNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCE