DETERMINATION OF THE H-DISTRIBUTION IN REACTIVELY SPUTTERED AMORPHOUS SILICON-HYDROGEN ALLOYS BY PROTON NUCLEAR MAGNETIC-RESONANCE

被引：13

作者：

JEFFREY, FR ^{[1
]}

LOWRY, ME ^{[1
]}

机构：

[1] IOWA STATE UNIV SCI & TECHNOL,DEPT CHEM,AMES,IA 50011

来源：

JOURNAL OF APPLIED PHYSICS | 1981年 / 52卷 / 09期

关键词：

D O I：

10.1063/1.329535

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5529 / 5533

页数：5

共 18 条

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[9] EFFECT OF HYDROGEN CONTENT ON THE PROPERTIES OF REACTIVELY SPUTTERED AMORPHOUS SI-H [J].

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[10] CONTROL OF DIHYDRIDE BOND DENSITY IN REACTIVE SPUTTERED AMORPHOUS-SILICON [J].

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