ION-BEAM-INDUCED CONDUCTIVITY IN POLYMER-FILMS

被引：113

作者：

VENKATESAN, T

FORREST, SR

KAPLAN, ML

MURRAY, CA

SCHMIDT, PH

WILKENS, BJ

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1983年 / 54卷 / 06期

关键词：

D O I：

10.1063/1.332471

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3150 / 3153

页数：4

共 17 条

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[8]

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[9] ION-BOMBARDMENT-INDUCED IMPROVEMENT OF PHOTORESIST MASK PROPERTIES FOR RF SPUTTER-ETCHING [J].

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