ION-BEAM EXPOSURE CHARACTERISTICS OF RESISTS - EXPERIMENTAL RESULTS

被引：98

作者：

HALL, TM ^{[1
]}

WAGNER, A ^{[1
]}

THOMPSON, LF ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

关键词：

D O I：

10.1063/1.331261

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3997 / 4010

页数：14

共 17 条

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