SOLID-SOLUTION HARDENING IN HIGH-RATE REACTIVELY SPUTTERED (HF, TI)N COATINGS

被引：7

作者：

FENSKE, GR ^{[1
]}

KAUFHERR, N ^{[1
]}

SPROUL, WD ^{[1
]}

机构：

[1] BORG WARNER CORP,DES PLAINES,IL 60018

来源：

THIN SOLID FILMS | 1987年 / 153卷

关键词：

SOLID SOLUTIONS - SPUTTERING - TITANIUM COMPOUNDS;

D O I：

10.1016/0040-6090(87)90179-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Coatings of (Hf, Ti)N were deposited by a high rate reactive sputtering process using a dual-cathode configuration. The coatings were analyzed to determine the effect of film composition on microhardness. Solid solution hardening was observed and was dependent on the partial pressure of the reactive gas (N//2). At the pressure where hardening was observed, the maximum hardness (3760 HV at 100 gf) occurred at a Ti:(Ti plus Hf) ratio of approximately 50%.

引用

页码：159 / 168

页数：10

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