AUGER-ELECTRON SPECTROSCOPY AND SPUTTER AUGER ANALYSES OF THIN-FILMS OF SICX

被引：22

作者：

MORGEN, P

SEAWARD, KL

BARBEE, TW

机构：

[1] STANFORD UNIV,DEPT ELECT ENGN,STANFORD,CA 94305

[2] STANFORD UNIV,DEPT MAT SCI & ENGN,STANFORD,CA 94305

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 06期

关键词：

D O I：

10.1116/1.573262

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：2108 / 2115

页数：8

相关论文

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