AN X-RAY STEPPER FOR SYNCHROTRON RADIATION LITHOGRAPHY

被引：12

作者：

KOUNO, E ^{[1
]}

TANAKA, Y ^{[1
]}

IWATA, J ^{[1
]}

TASAKI, Y ^{[1
]}

KAKIMOTO, E ^{[1
]}

OKADA, K ^{[1
]}

SUZUKI, K ^{[1
]}

FUJII, K ^{[1
]}

NOMURA, E ^{[1
]}

机构：

[1] NEC CORP,MICROELECTR RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.584101

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2135 / 2138

页数：4

共 8 条

[1]

CULLMANN E, 1987, SPIE, V773, P2

[2]

CULLMANN E, 1983, SPIE P, V448, P104

[3]

FAY B, 1979, J VAC SCI TECHNOL, V16, P1954, DOI 10.1116/1.570364

[4]

FUJII K, IN PRESS J VAC SCI B

[5] A STEP-AND-REPEAT X-RAY-EXPOSURE SYSTEM FOR 0.5-MU-PATTERN REPLICATION [J].

HAYASAKA, T ;

ISHIHARA, S ;

KINOSHITA, H ;

TAKEUCHI, N .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (06) :1581-1586

[6] DEVELOPMENT OF HIGHLY RELIABLE SYNCHROTRON RADIATION LITHOGRAPHY BEAMLINE [J].

OKADA, K ;

FUJII, K ;

KAWASE, Y ;

NAGANO, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01) :191-194

[7]

Suzuki K., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V632, P139, DOI 10.1117/12.963678

[8]

Une A., 1987, Proceedings of the SPIE - The International Society for Optical Engineering, V773, P45, DOI 10.1117/12.940352

← 1 →