THE EFFECT OF GAS PURITY ON THE REFLECTANCE AND RESISTIVITY OF MAGNETRON SPUTTERED ALUMINUM AND ITS ALLOYS

被引:4
作者
NYAIESH, AR
HOLLAND, L
机构
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D O I
10.1016/0042-207X(82)93845-3
中图分类号
T [工业技术];
学科分类号
08 ;
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页码:735 / 736
页数:2
相关论文
共 3 条
[1]   TUNNEL MAGNETRON CHARACTERISTICS AND DISCHARGE DIAGNOSTICS [J].
HOLLAND, L .
THIN SOLID FILMS, 1981, 86 (2-3) :227-239
[2]   THE EFFECTS OF GAS-COMPOSITION ON DISCHARGE AND DEPOSITION CHARACTERISTICS WHEN MAGNETRON SPUTTERING ALUMINUM [J].
NYAIESH, AR ;
HOLLAND, L .
VACUUM, 1981, 31 (8-9) :371-375
[3]  
NYAIESH AR, VACUUM