SIMULATION AND GROWTH-RATE UNIFORMITY OF MOVPE INP USING ADDUCTS

被引:8
作者
FIELD, RJ [1 ]
SCHOLZ, F [1 ]
机构
[1] UNIV STUTTGART,INST PHYS,D-7000 STUTTGART 80,FED REP GER
关键词
Experimental growth and measurements were carried out at the Universitat Stuttgart. We thank G. Laube; U; Nerz; P. Wiedemann and K. Streu-bel for their experimental assistance. Computer simulations were carried out at the ITT Advanced Technology Center and at Yale University. We thank B. Alphenaar for programming assistance;
D O I
10.1016/0022-0248(88)90010-3
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
25
引用
收藏
页码:371 / 378
页数:8
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  • [21] A NEW APPROACH TO MOCVD OF INDIUM-PHOSPHIDE AND GALLIUM-INDIUM ARSENIDE
    MOSS, RH
    EVANS, JS
    [J]. JOURNAL OF CRYSTAL GROWTH, 1981, 55 (01) : 129 - 134
  • [22] ADDUCTS IN THE GROWTH OF III-V-COMPOUNDS
    MOSS, RH
    [J]. JOURNAL OF CRYSTAL GROWTH, 1984, 68 (01) : 78 - 87
  • [23] INP, GAINAS AND QUANTUM-WELL STRUCTURES GROWN BY ADDUCT MOVPE
    SCHOLZ, F
    WIEDEMANN, P
    NERZ, U
    BENZ, KW
    TRANKLE, G
    LACH, E
    FORCHEL, A
    LAUBE, G
    WEIDLEIN, J
    [J]. JOURNAL OF CRYSTAL GROWTH, 1986, 77 (1-3) : 564 - 570
  • [24] APPLICATION OF FINITE ELEMENT METHOD TO MASS TRANSPORT LIMITED EPITAXIAL GROWTH PROCESSES
    SECREST, BG
    BOYD, WW
    SHAW, DW
    [J]. JOURNAL OF CRYSTAL GROWTH, 1971, 10 (03) : 251 - &
  • [25] GAS-PHASE DEPLETION AND FLOW DYNAMICS IN HORIZONTAL MOCVD REACTORS
    VANDEVEN, J
    RUTTEN, GMJ
    RAAIJMAKERS, MJ
    GILING, LJ
    [J]. JOURNAL OF CRYSTAL GROWTH, 1986, 76 (02) : 352 - 372