MICROSTRUCTURAL OBSERVATIONS OF SPUTTERED SILICON-TIN-HYDROGEN ALLOYS

被引：13

作者：

JONES, KM

WILLIAMSON, DL

YACOBI, BG

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1984年 / 56卷 / 04期

关键词：

D O I：

10.1063/1.334053

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1220 / 1223

页数：4

相关论文

共 7 条

[1] DEPENDENCE OF THE MICROSTRUCTURE OF AMORPHOUS-SILICON THIN-FILMS PREPARED BY PLANAR RF MAGNETRON SPUTTERING ON DEPOSITION PARAMETERS
DAS, SR
WILLIAMS, DF
WEBB, JB
[J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (06) : 3101 - 3105
[2] MICROSTRUCTURE OF PLASMA-DEPOSITED A-SI-H FILMS
KNIGHTS, JC
LUJAN, RA
[J]. APPLIED PHYSICS LETTERS, 1979, 35 (03) : 244 - 246
[3] KUWANO Y, 1983, 16TH IEEE PV SPEC C, P1338
[4] EVOLUTION OF MICROSTRUCTURE IN AMORPHOUS HYDROGENATED SILICON
MESSIER, R
ROSS, RC
[J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (09) : 6220 - 6225
[5] INFLUENCE OF DEPOSITION CONDITIONS ON SPUTTER-DEPOSITED AMORPHOUS SILICON
PAWLEWICZ, WT
[J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (11) : 5595 - 5601
[6] PROPERTIES OF AMORPHOUS HYDROGENATED SILICON-TIN ALLOYS PREPARED BY RADIO-FREQUENCY SPUTTERING
WILLIAMSON, DL
KERNS, RC
DEB, SK
[J]. JOURNAL OF APPLIED PHYSICS, 1984, 55 (08) : 2816 - 2824
[7] WILLIAMSON DL, 1983, J APPL PHYS, V54, P2583