MORPHOLOGICAL EFFECT OF A CLEAN SI SURFACE ON NH3 DISSOCIATIVE ADSORPTION

被引：16

作者：

CHERIF, SM

LACHARME, JP

SEBENNE, CA

机构：

[1] Laboratoire de Physique des Solides, associé au CNRS No. 154, Université Pierre et Marie Curie, 75252 Paris Cedex 05

来源：

APPLIED SURFACE SCIENCE | 1992年 / 56-8卷

关键词：

D O I：

10.1016/0169-4332(92)90337-W

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The interaction of NH3 in the 10(-2)-10(2) langmuir exposure range with different Si surfaces, namely (111) 2 x 1 and 7 x 7 reconstructed as well as (100) 2 x 1 either stepped or not, is compared. Upon saturation, characterized by a removal of the surface dangling bonds (DB) and a net decrease of the ionization energy, Si(111) 7 x 7 differs from other surfaces in saturating at one NH3 molecule per 2 DB against 4 for the others. The various results are explained within a common picture where the NH3 molecule dissociates into one NH2 radical and one hydrogen atom, each species being able to remove 2 DB, if they are close enough.

引用

页码：777 / 781

页数：5

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