ELECTRON-ENERGY DISTRIBUTION FUNCTION IN A DC MAGNETRON SPUTTERING DISCHARGE

被引:23
作者
IVANOV, I [1 ]
STATEV, S [1 ]
ORLINOV, V [1 ]
SHKEVOV, R [1 ]
机构
[1] BULGARIAN ACAD SCI,SPACE RES INST,BU-1000 SOFIA,BULGARIA
关键词
D O I
10.1016/0042-207X(92)90148-P
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The electron energy distribution function (EEDF) of a dc magnetron sputtering discharge ignited in either pure argon gas or a mixture of Ar and 4.7% methane is measured in the substrate vicinity (7 cm from the cathode) using ac differentiation of a cylindrical Langmuir probe characteristic. The results show the presence of two energy groups at a small discharge current I = 0.1 A for two values of argon gas pressure p = 0.4 and 1.07 Pa. The high-energy electron group is more pronounced at the lower pressure p of the sputtering gas and disappears with increasing 1. The small amount of methane gas in the argon does not affect significantly EEDF at the location of measurement, if compared with that obtained in pure argon. Fitting the measured EEDF to the equation f(E) = a.E0.5 exp (-b . E(x)) we find values of x in the range 1.43 1.70, which corresponds to a distribution between those of the Maxwellian (x = 1) and Druyvesteyn (x = 2) ones. The mean electron energies [E]M calculated from the measured EEDF are in the range of 4.8 7. 1 eV, depending on the discharge conditions. For our conditions of operation, the comparison of [E]m values with those obtained by means of the standard Langmuir technique [[E]L = 1.5(kT(e))] shows a reasonable agreement ([E]L = 4.4-6.0 eV).
引用
收藏
页码:837 / 842
页数:6
相关论文
共 23 条
[21]   PLASMA POLYMERIZATION BY MAGNETRON GLOW-DISCHARGE .2. EFFECT OF MAGNETIC-FIELD ON CHEMICAL CHARACTERISTICS OF PLASMA POLYMERS OF TETRAFLUOROETHYLENE REVEALED BY ELECTRON-SPECTROSCOPY FOR CHEMICAL-ANALYSIS [J].
SATO, K ;
YEH, YS ;
YASUDA, H .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (06) :3188-3196
[22]   LANGMUIR PROBE CHARACTERIZATION OF A RF DISCHARGE EXCITED IN AR/C2F3CL MIXTURES DURING PLASMA DEPOSITION PROCESSES [J].
SPATENKA, P ;
SICHA, M .
CONTRIBUTIONS TO PLASMA PHYSICS, 1989, 29 (01) :57-66
[23]   DIAGNOSTIC METHODS FOR SPUTTERING PLASMAS [J].
THORNTON, JA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :188-192