HYDROGENATED AMORPHOUS-SILICON FILMS DEPOSITED BY REACTIVE SPUTTERING - THE ELECTRONIC-PROPERTIES, HYDROGEN-BONDING AND MICROSTRUCTURE

被引：77

作者：

PINARBASI, M ^{[1
]}

MALEY, N ^{[1
]}

MYERS, A ^{[1
]}

ABELSON, JR ^{[1
]}

机构：

[1] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801

来源：

THIN SOLID FILMS | 1989年 / 171卷 / 01期

关键词：

36;

D O I：

10.1016/0040-6090(89)90045-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：217 / 233

页数：17

共 36 条

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[2] COMPARATIVE-STUDY OF HYDROGEN EVOLUTION FROM AMORPHOUS HYDROGENATED SILICON FILMS
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[J]. THIN SOLID FILMS, 1982, 90 (02) : 145 - 152
[3] THE ROLE OF HYDROGEN IN A-SI-H - RESULTS OF EVOLUTION AND ANNEALING STUDIES
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[J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1983, 59-6 (DEC) : 161 - 168
[4] HYDROGEN EVOLUTION AND DEFECT CREATION IN AMORPHOUS SI-H ALLOYS
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[J]. PHYSICAL REVIEW B, 1979, 20 (12): : 4839 - 4846
[5] BRODSKY MH, 1977, PHYS REV B, V16, P3556, DOI 10.1103/PhysRevB.16.3556
[6] THE RELATION BETWEEN MICROSTRUCTURE AND HYDROGEN CONTENT AND EVOLUTION FOR HYDROGENATED AMORPHOUS-SILICON FILMS PREPARED BY MAGNETRON SPUTTERING
DAS, SR
CHARBONNEAU, S
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[J]. CANADIAN JOURNAL OF PHYSICS, 1985, 63 (06) : 852 - 858
[7] HYDROGEN CONTENT OF A-GE-H AND A-SI-H AS DETERMINED BY IR SPECTROSCOPY, GAS EVOLUTION AND NUCLEAR-REACTION TECHNIQUES
FANG, CJ
GRUNTZ, KJ
LEY, L
CARDONA, M
DEMOND, FJ
MULLER, G
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[J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 35-6 (JAN-) : 255 - 260
[8] CHARACTERIZATION OF GLOW-DISCHARGE DEPOSITED A-SI-H
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[J]. SOLAR ENERGY MATERIALS, 1980, 3 (04): : 447 - 501
[9] FRITZSCHE H, 1977, 7TH P INT C AM LIQ S, P3
[10] NEUTRAL RADICAL DEPOSITION FROM SILANE DISCHARGES
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[J]. JOURNAL OF APPLIED PHYSICS, 1988, 63 (07) : 2406 - 2413

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