SHEATH PROPERTIES OF RF PLASMAS IN A PARALLEL PLATE ETCH REACTOR - THE HIGH-FREQUENCY REGIME (OMEGA GREATER-THAN OMEGA-I)

被引：21

作者：

VALLINGA, PM

MEIJER, PM

DEHOOG, FJ

机构：

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1989年 / 22卷 / 11期

关键词：

D O I：

10.1088/0022-3727/22/11/014

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1650 / 1657

页数：8

共 19 条

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