STRUCTURE OF RF PARALLEL-PLATE DISCHARGES

[1] EXCITATION OF METASTABLE N2(A3SIGMA+/MU) VIBRATIONAL LEVELS BY ELECTRON-IMPACT [J]. JOURNAL OF CHEMICAL PHYSICS, 1973, 59 (11) : 5830 - 5836

[2] ELECTRON-IMPACT EXCITATION OF ELECTRONIC STATES OF N2 .2. INTEGRAL CROSS-SECTIONS AT INCIDENT ENERGIES FROM 10 TO 50 EV [J]. PHYSICAL REVIEW A, 1977, 16 (03): : 1041 - 1051

[3] Chapman B., 1980, GLOW DISCHARGE PROCE

[4] OPTICAL-EMISSION SPECTROSCOPY OF REACTIVE PLASMAS - A METHOD FOR CORRELATING EMISSION INTENSITIES TO REACTIVE PARTICLE DENSITY [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (06) : 3134 - 3136

[5] SPECTROSCOPIC DIAGNOSTICS OF CF4-O2 PLASMAS DURING SI AND SIO2 ETCHING PROCESSES [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (03) : 1259 - 1265

[6] EVIDENCE FOR A TIME-DEPENDENT EXCITATION PROCESS IN SILANE RADIO-FREQUENCY GLOW-DISCHARGES [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (05) : 2272 - 2275

[7] MICROWAVE SPECTROSCOPIC MEASUREMENT OF THE ELECTRON-DENSITY IN A PLANAR DISCHARGE - RELATION TO REACTIVE-ION ETCHING OF SILICON-OXIDE [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (09) : 4386 - 4390

[8] GARSCADDEN A, 1983, INT S PLASMA CHEM, V6

[9] OPTICAL-EMISSION ACTINOMETRY AND SPECTRAL-LINE SHAPES IN RF GLOW-DISCHARGES [J]. JOURNAL OF APPLIED PHYSICS, 1984, 56 (02) : 245 - 250

[10] GOTTSCHO RA, 1985, UNPUB MAT RES SOC P

[1] EXCITATION OF METASTABLE N2(A3SIGMA+/MU) VIBRATIONAL LEVELS BY ELECTRON-IMPACT [J]. JOURNAL OF CHEMICAL PHYSICS, 1973, 59 (11) : 5830 - 5836

[2] ELECTRON-IMPACT EXCITATION OF ELECTRONIC STATES OF N2 .2. INTEGRAL CROSS-SECTIONS AT INCIDENT ENERGIES FROM 10 TO 50 EV [J]. PHYSICAL REVIEW A, 1977, 16 (03): : 1041 - 1051

[3] Chapman B., 1980, GLOW DISCHARGE PROCE

[4] OPTICAL-EMISSION SPECTROSCOPY OF REACTIVE PLASMAS - A METHOD FOR CORRELATING EMISSION INTENSITIES TO REACTIVE PARTICLE DENSITY [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (06) : 3134 - 3136

[5] SPECTROSCOPIC DIAGNOSTICS OF CF4-O2 PLASMAS DURING SI AND SIO2 ETCHING PROCESSES [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (03) : 1259 - 1265

[6] EVIDENCE FOR A TIME-DEPENDENT EXCITATION PROCESS IN SILANE RADIO-FREQUENCY GLOW-DISCHARGES [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (05) : 2272 - 2275

[7] MICROWAVE SPECTROSCOPIC MEASUREMENT OF THE ELECTRON-DENSITY IN A PLANAR DISCHARGE - RELATION TO REACTIVE-ION ETCHING OF SILICON-OXIDE [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (09) : 4386 - 4390

[8] GARSCADDEN A, 1983, INT S PLASMA CHEM, V6

[9] OPTICAL-EMISSION ACTINOMETRY AND SPECTRAL-LINE SHAPES IN RF GLOW-DISCHARGES [J]. JOURNAL OF APPLIED PHYSICS, 1984, 56 (02) : 245 - 250

[10] GOTTSCHO RA, 1985, UNPUB MAT RES SOC P