PERIODICAL NANOSTRUCTURE FABRICATION USING ELECTRON INTERFERENCE-FRINGES PRODUCED BY SCANNING INTERFERENCE ELECTRON-MICROSCOPE

被引：10

作者：

FUJITA, S

MARUNO, S

WATANABE, H

KUSUMI, Y

ICHIKAWA, M

机构：

[1] Joint Research Center for Atom Technology, Angstrom Technology Partnership, C/o National Institute for Advanced Interdisciplinary Research, Tsukuba, Ibaraki 305

来源：

APPLIED PHYSICS LETTERS | 1995年 / 66卷 / 20期

关键词：

D O I：

10.1063/1.113698

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A scanning interference electron microscope (SIEM) has been developed for periodical nanostructure fabrication. This system can produce electron interference fringes with a period from 2 nm to several tens of micrometers. Fabrications of periodical nanostructures with 23 to 170 nm periods have been demonstrated by transferring the electron interference fringe onto the semiconductor surfaces.© 1995 American Institute of Physics.

引用

页码：2754 / 2756

页数：3

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