ASPECTS FOR THE DESIGN OF SPUTTERING SYSTEMS

被引：9

作者：

MANIV, S

机构：

来源：

关键词：

D O I：

10.1016/0042-207X(83)90057-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：215 / 219

页数：5

共 29 条

[1]

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FOSTER, NF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01) :111-&

[3]

HARPER JME, SPUTTER DEPOSITION I, P21

[4] ZINC-OXIDE THIN-FILM SURFACE-WAVE TRANSDUCERS [J].

HICKERNELL, FS .

[5]

HICKERNELL FS, 1981, P IEEE ULTR S, P489

[6]

INGOLD JH, 1978, GASEOUS ELECTRONICS, V1

[7]

KONIG HR, 1970, IBM J RES DEV, V14, P168

[8]

MAISSEL LI, 1970, HDB THIN FILM TECHNO, pCH4

MANIV, S ;

WESTWOOD, WD ;

SCANLON, PJ .

MANIV, S ;

WESTWOOD, WD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (03) :743-751