CRYSTALLIZATION AND RESISTIVITY OF AMORPHOUS TITANIUM SILICIDE FILMS DEPOSITED BY CO-EVAPORATION

被引：21

作者：

KEMPER, MJH

OOSTING, PH

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 09期

关键词：

D O I：

10.1063/1.331535

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：6214 / 6219

页数：6

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