ION-ASSISTED DEPOSITION OF BULKLIKE ZRO2 FILMS

被引：30

作者：

MARTIN, PJ

NETTERFIELD, RP

SAINTY, WG

CLARK, GJ

LANFORD, WA

SIE, SH

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

[2] SUNY ALBANY,DEPT PHYS,ALBANY,NY 12222

[3] CSIRO,DIV MINERAL PHYS,N RYDE,NSW 2113,AUSTRALIA

来源：

关键词：

D O I：

10.1063/1.94485

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：711 / 713

页数：3

共 8 条

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[4] Klechkovskaya V. V., 1980, Soviet Physics - Crystallography, V25, P636
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