MECHANICAL STRESSES IN LOW-PRESSURE CHEMICALLY VAPOR-DEPOSITED SILICON FILMS

被引：11

作者：

KOLESHKO, VM

BELITSKY, VF

KIRYUSHIN, IV

机构：

来源：

THIN SOLID FILMS | 1988年 / 165卷 / 01期

关键词：

D O I：

10.1016/0040-6090(88)90689-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

(Edited Abstract)

引用

页码：181 / 191

页数：11

共 15 条

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[2]

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[5]

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[6] CRYSTALLIZATION OF AMORPHOUS-SILICON FILMS DURING LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION [J].

KINSBRON, E ;

STERNHEIM, M ;

KNOELL, R .

APPLIED PHYSICS LETTERS, 1983, 42 (09) :835-837

[7] STRESS-RELAXATION IN THIN ALUMINUM FILMS [J].

KOLESHKO, VM ;

BELITSKY, VF ;

KIRYUSHIN, IV .

THIN SOLID FILMS, 1986, 142 (02) :199-212

[8]

KOLESHKO VM, 1979, INSPECTION MICROELEC, P311

[9]

KOLESHKO VM, 1978, POLYCRYSTALLINE SEMI, P343

[10]

KOLESHKO VM, 1985, VESTSI AKAD NAUK FMN, V4, P67

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