STEP STRUCTURES DURING MBE GROWTH OF GAAS AND ALGAAS FILMS ON VICINAL GAAS(110) SURFACES INCLINED TOWARD (111)B

被引:15
作者
HASEGAWA, S
KIMURA, K
SATO, M
MAEHASHI, K
NAKASHIMA, H
机构
[1] The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka, 567, Mihogaoka
关键词
D O I
10.1016/0039-6028(92)91075-M
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have investigated step structures during molecular beam epitaxial (MBE) growth of GaAs and AlGaAs films on vicinal GaAs(110) surfaces inclined at 6-degrees toward (111)B using reflection high-energy electron diffraction. We find that during AlGaAs growth at temperatures above 630-degrees-C, the surfaces contain regular arrays of steps with double-layer height. At temperatures below 610-degrees-C, the surface breaks up into two types of regions: one consisting of wide (110) facets without steps, the other consisting of arrays of steps with a high step density. During GaAs growth at temperatures above 580-degrees-C, all the surfaces contain well-ordered arrays of steps with double-layer height. Based on the results, we discuss the formation mechanism of the quantum well wire-like structures reported previously.
引用
收藏
页码:5 / 7
页数:3
相关论文
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