RADIOLYSIS OF RESIST POLYMERS .1. POLY(METHYL ALPHA-HALOACRYLATES) AND COPOLYMERS WITH METHYL-METHACRYLATE

被引：31

作者：

BABU, GN

NARULA, A

HSU, SL

CHIEN, JCW

机构：

[1] UNIV MASSACHUSETTS,DEPT CHEM,AMHERST,MA 01003

[2] UNIV MASSACHUSETTS,DEPT POLYMER SCI & ENGN,MAT RES LABS,AMHERST,MA 01003

来源：

MACROMOLECULES | 1984年 / 17卷 / 12期

关键词：

D O I：

10.1021/ma00142a054

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：2749 / 2755

页数：7

共 17 条

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[7] ELECTRON-SENSITIVE RESISTS .2. POSITIVE RESISTS DERIVED FROM HIGH POLYMERS OF METHYL-METHACRYLATE, METHYL ALPHA-CHLOROACRYLATE, AND HEXYL METHACRYLATE
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[8] STUDIES OF METHYL METHACRYLATE-METHYL ALPHA-CHLOROACRYLATE COPOLYMERS AND POLY(METHYL ALPHA-CHLOROACRYLATE) AS ELECTRON SENSITIVE POSITIVE RESISTS
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[9] INTERACTION OF 5 KEV ELECTRONS WITH POLYMERS OF METHYL ISOPROPENYL KETONE
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[J]. POLYMER ENGINEERING AND SCIENCE, 1974, 14 (07) : 518 - 524
[10] COMPARISON OF THE PRECISION OF ESTIMATION OF CO-POLYMERIZATION REACTIVITY RATIOS BY CURRENT METHODS
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