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DIRECT OBSERVATION OF BALLISTIC ELECTRONS IN SILICON DIOXIDE
被引:31
作者
:
DIMARIA, DJ
论文数:
0
引用数:
0
h-index:
0
DIMARIA, DJ
FISCHETTI, MV
论文数:
0
引用数:
0
h-index:
0
FISCHETTI, MV
BATEY, J
论文数:
0
引用数:
0
h-index:
0
BATEY, J
DORI, L
论文数:
0
引用数:
0
h-index:
0
DORI, L
TIERNEY, E
论文数:
0
引用数:
0
h-index:
0
TIERNEY, E
STASIAK, J
论文数:
0
引用数:
0
h-index:
0
STASIAK, J
机构
:
来源
:
PHYSICAL REVIEW LETTERS
|
1986年
/ 57卷
/ 25期
关键词
:
D O I
:
10.1103/PhysRevLett.57.3213
中图分类号
:
O4 [物理学];
学科分类号
:
0702 ;
摘要
:
引用
收藏
页码:3213 / 3216
页数:4
相关论文
共 21 条
[1]
SCATTERING BY IONIZATION AND PHONON EMISSION IN SEMICONDUCTORS
[J].
ALIG, RC
论文数:
0
引用数:
0
h-index:
0
ALIG, RC
;
BLOOM, S
论文数:
0
引用数:
0
h-index:
0
BLOOM, S
;
STRUCK, CW
论文数:
0
引用数:
0
h-index:
0
STRUCK, CW
.
PHYSICAL REVIEW B,
1980,
22
(12)
:5565
-5582
[2]
ARIENZO M, UNPUB
[3]
LOW-TEMPERATURE DEPOSITION OF HIGH-QUALITY SILICON DIOXIDE BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION
[J].
BATEY, J
论文数:
0
引用数:
0
h-index:
0
BATEY, J
;
TIERNEY, E
论文数:
0
引用数:
0
h-index:
0
TIERNEY, E
.
JOURNAL OF APPLIED PHYSICS,
1986,
60
(09)
:3136
-3145
[4]
DIRECT MEASUREMENT OF THE ENERGY-DISTRIBUTION OF HOT-ELECTRONS IN SILICON DIOXIDE
[J].
BRORSON, SD
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
BRORSON, SD
;
DIMARIA, DJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
DIMARIA, DJ
;
FISCHETTI, MV
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
FISCHETTI, MV
;
PESAVENTO, FL
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
PESAVENTO, FL
;
SOLOMON, PM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
SOLOMON, PM
;
DONG, DW
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
DONG, DW
.
JOURNAL OF APPLIED PHYSICS,
1985,
58
(03)
:1302
-1313
[5]
ELECTRON HEATING STUDIES IN SILICON DIOXIDE - LOW FIELDS AND THICK-FILMS
[J].
DIMARIA, DJ
论文数:
0
引用数:
0
h-index:
0
DIMARIA, DJ
;
FISCHETTI, MV
论文数:
0
引用数:
0
h-index:
0
FISCHETTI, MV
;
ARIENZO, M
论文数:
0
引用数:
0
h-index:
0
ARIENZO, M
;
TIERNEY, E
论文数:
0
引用数:
0
h-index:
0
TIERNEY, E
.
JOURNAL OF APPLIED PHYSICS,
1986,
60
(05)
:1719
-1726
[6]
DIRECT OBSERVATION OF THE THRESHOLD FOR ELECTRON HEATING IN SILICON DIOXIDE
[J].
DIMARIA, DJ
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
DIMARIA, DJ
;
FISCHETTI, MV
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
FISCHETTI, MV
;
TIERNEY, E
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
TIERNEY, E
;
BRORSON, SD
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
BRORSON, SD
.
PHYSICAL REVIEW LETTERS,
1986,
56
(12)
:1284
-1286
[7]
ELECTRON HEATING IN SILICON DIOXIDE AND OFF-STOICHIOMETRIC SILICON DIOXIDE FILMS
[J].
DIMARIA, DJ
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
DIMARIA, DJ
;
THEIS, TN
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
THEIS, TN
;
KIRTLEY, JR
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
KIRTLEY, JR
;
PESAVENTO, FL
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
PESAVENTO, FL
;
DONG, DW
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
DONG, DW
;
BRORSON, SD
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
BRORSON, SD
.
JOURNAL OF APPLIED PHYSICS,
1985,
57
(04)
:1214
-1238
[8]
MONTE-CARLO SOLUTION TO THE PROBLEM OF HIGH-FIELD ELECTRON HEATING IN SIO2
[J].
FISCHETTI, MV
论文数:
0
引用数:
0
h-index:
0
FISCHETTI, MV
.
PHYSICAL REVIEW LETTERS,
1984,
53
(18)
:1755
-1758
[9]
THEORY OF HIGH-FIELD ELECTRON-TRANSPORT IN SILICON DIOXIDE
[J].
FISCHETTI, MV
论文数:
0
引用数:
0
h-index:
0
FISCHETTI, MV
;
DIMARIA, DJ
论文数:
0
引用数:
0
h-index:
0
DIMARIA, DJ
;
BRORSON, SD
论文数:
0
引用数:
0
h-index:
0
BRORSON, SD
;
THEIS, TN
论文数:
0
引用数:
0
h-index:
0
THEIS, TN
;
KIRTLEY, JR
论文数:
0
引用数:
0
h-index:
0
KIRTLEY, JR
.
PHYSICAL REVIEW B,
1985,
31
(12)
:8124
-8142
[10]
QUANTUM MONTE-CARLO SIMULATION OF HIGH-FIELD ELECTRON-TRANSPORT - AN APPLICATION TO SILICON DIOXIDE
[J].
FISCHETTI, MV
论文数:
0
引用数:
0
h-index:
0
FISCHETTI, MV
;
DIMARIA, DJ
论文数:
0
引用数:
0
h-index:
0
DIMARIA, DJ
.
PHYSICAL REVIEW LETTERS,
1985,
55
(22)
:2475
-2478
←
1
2
3
→
共 21 条
[1]
SCATTERING BY IONIZATION AND PHONON EMISSION IN SEMICONDUCTORS
[J].
ALIG, RC
论文数:
0
引用数:
0
h-index:
0
ALIG, RC
;
BLOOM, S
论文数:
0
引用数:
0
h-index:
0
BLOOM, S
;
STRUCK, CW
论文数:
0
引用数:
0
h-index:
0
STRUCK, CW
.
PHYSICAL REVIEW B,
1980,
22
(12)
:5565
-5582
[2]
ARIENZO M, UNPUB
[3]
LOW-TEMPERATURE DEPOSITION OF HIGH-QUALITY SILICON DIOXIDE BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION
[J].
BATEY, J
论文数:
0
引用数:
0
h-index:
0
BATEY, J
;
TIERNEY, E
论文数:
0
引用数:
0
h-index:
0
TIERNEY, E
.
JOURNAL OF APPLIED PHYSICS,
1986,
60
(09)
:3136
-3145
[4]
DIRECT MEASUREMENT OF THE ENERGY-DISTRIBUTION OF HOT-ELECTRONS IN SILICON DIOXIDE
[J].
BRORSON, SD
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
BRORSON, SD
;
DIMARIA, DJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
DIMARIA, DJ
;
FISCHETTI, MV
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
FISCHETTI, MV
;
PESAVENTO, FL
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
PESAVENTO, FL
;
SOLOMON, PM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
SOLOMON, PM
;
DONG, DW
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
DONG, DW
.
JOURNAL OF APPLIED PHYSICS,
1985,
58
(03)
:1302
-1313
[5]
ELECTRON HEATING STUDIES IN SILICON DIOXIDE - LOW FIELDS AND THICK-FILMS
[J].
DIMARIA, DJ
论文数:
0
引用数:
0
h-index:
0
DIMARIA, DJ
;
FISCHETTI, MV
论文数:
0
引用数:
0
h-index:
0
FISCHETTI, MV
;
ARIENZO, M
论文数:
0
引用数:
0
h-index:
0
ARIENZO, M
;
TIERNEY, E
论文数:
0
引用数:
0
h-index:
0
TIERNEY, E
.
JOURNAL OF APPLIED PHYSICS,
1986,
60
(05)
:1719
-1726
[6]
DIRECT OBSERVATION OF THE THRESHOLD FOR ELECTRON HEATING IN SILICON DIOXIDE
[J].
DIMARIA, DJ
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
DIMARIA, DJ
;
FISCHETTI, MV
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
FISCHETTI, MV
;
TIERNEY, E
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
TIERNEY, E
;
BRORSON, SD
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
BRORSON, SD
.
PHYSICAL REVIEW LETTERS,
1986,
56
(12)
:1284
-1286
[7]
ELECTRON HEATING IN SILICON DIOXIDE AND OFF-STOICHIOMETRIC SILICON DIOXIDE FILMS
[J].
DIMARIA, DJ
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
DIMARIA, DJ
;
THEIS, TN
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
THEIS, TN
;
KIRTLEY, JR
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
KIRTLEY, JR
;
PESAVENTO, FL
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
PESAVENTO, FL
;
DONG, DW
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
DONG, DW
;
BRORSON, SD
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
BRORSON, SD
.
JOURNAL OF APPLIED PHYSICS,
1985,
57
(04)
:1214
-1238
[8]
MONTE-CARLO SOLUTION TO THE PROBLEM OF HIGH-FIELD ELECTRON HEATING IN SIO2
[J].
FISCHETTI, MV
论文数:
0
引用数:
0
h-index:
0
FISCHETTI, MV
.
PHYSICAL REVIEW LETTERS,
1984,
53
(18)
:1755
-1758
[9]
THEORY OF HIGH-FIELD ELECTRON-TRANSPORT IN SILICON DIOXIDE
[J].
FISCHETTI, MV
论文数:
0
引用数:
0
h-index:
0
FISCHETTI, MV
;
DIMARIA, DJ
论文数:
0
引用数:
0
h-index:
0
DIMARIA, DJ
;
BRORSON, SD
论文数:
0
引用数:
0
h-index:
0
BRORSON, SD
;
THEIS, TN
论文数:
0
引用数:
0
h-index:
0
THEIS, TN
;
KIRTLEY, JR
论文数:
0
引用数:
0
h-index:
0
KIRTLEY, JR
.
PHYSICAL REVIEW B,
1985,
31
(12)
:8124
-8142
[10]
QUANTUM MONTE-CARLO SIMULATION OF HIGH-FIELD ELECTRON-TRANSPORT - AN APPLICATION TO SILICON DIOXIDE
[J].
FISCHETTI, MV
论文数:
0
引用数:
0
h-index:
0
FISCHETTI, MV
;
DIMARIA, DJ
论文数:
0
引用数:
0
h-index:
0
DIMARIA, DJ
.
PHYSICAL REVIEW LETTERS,
1985,
55
(22)
:2475
-2478
←
1
2
3
→