THICKNESS DEPENDENCE OF THE PROPERTIES OF PLASMA-DEPOSITED A-SI-H FILMS - NMR-STUDIES

被引：8

作者：

BOYCE, JB

THOMPSON, MJ

机构：

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1984年 / 66卷 / 1-2期

关键词：

D O I：

10.1016/0022-3093(84)90310-7

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：127 / 132

页数：6

共 14 条

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[9] HYDROGEN PROFILING IN AMORPHOUS-SILICON FILMS AND P-N-JUNCTIONS [J].

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[10] THICKNESS DEPENDENT PROPERTIES OF SPUTTERED A-SI-H FROM RAMAN AND CONDUCTIVITY MEASUREMENT [J].

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