REAL-SPACE TRANSFER IN 3-TERMINAL INGAAS/INALAS/INGAAS HETEROSTRUCTURE DEVICES

被引:30
作者
MENSZ, PM
LURYI, S
CHO, AY
SIVCO, DL
REN, F
机构
关键词
D O I
10.1063/1.102889
中图分类号
O59 [应用物理学];
学科分类号
摘要
Three-terminal real-space transfer devices have been implemented in InGaAs/InAlAs/InGaAs heterostructure material. The use of nonalloyed contacts provides excellent ohmic contacts to the channel without compromising insulation from the second conducting layer, The observed negative differential resistance has a peak-to-valley ratio that typically exceeds 100, both at room temperature and cryogenic temperatures. The highest observed peak-to-valley ratio at 300 K was 490. With increasing heating voltage, the injection current across the InAlAs barrier rises in a sequence of sharp steps. We explain this feature by an instability caused by a positive feedback between the heating field in the channel and the local real-space transfer current.
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页码:2563 / 2565
页数:3
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