INITIAL-STAGES OF OXIDE FORMATION ON HGCDTE EXPOSED TO ACTIVATED OXYGEN

被引:25
作者
SILBERMAN, JA [1 ]
LASER, D [1 ]
LINDAU, I [1 ]
SPICER, WE [1 ]
WILSON, JA [1 ]
机构
[1] SANTA BARBARA RES CTR,GOLETA,CA 93017
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 03期
关键词
D O I
10.1116/1.572262
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:1706 / 1711
页数:6
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