GROWTH AND PROPERTIES OF SI/SIGE SUPERLATTICES

被引:86
作者
KASPER, E
机构
关键词
D O I
10.1016/0039-6028(86)90484-X
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:630 / 639
页数:10
相关论文
共 29 条
[1]   STRAIN-INDUCED TWO-DIMENSIONAL ELECTRON-GAS IN SELECTIVELY DOPED SI/SIXGE1-X SUPERLATTICES [J].
ABSTREITER, G ;
BRUGGER, H ;
WOLF, T ;
JORKE, H ;
HERZOG, HJ .
PHYSICAL REVIEW LETTERS, 1985, 54 (22) :2441-2444
[2]  
ABSTREITER G, 1986, SURFACE SCI, V172, P640
[3]   PSEUDOMORPHIC GROWTH OF GEXSI1-X ON SILICON BY MOLECULAR-BEAM EPITAXY [J].
BEAN, JC ;
SHENG, TT ;
FELDMAN, LC ;
FIORY, AT ;
LYNCH, RT .
APPLIED PHYSICS LETTERS, 1984, 44 (01) :102-104
[4]   GEXSI1-X/SI STRAINED-LAYER SUPERLATTICE GROWN BY MOLECULAR-BEAM EPITAXY [J].
BEAN, JC ;
FELDMAN, LC ;
FIORY, AT ;
NAKAHARA, S ;
ROBINSON, IK .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02) :436-440
[5]  
BEAN JC, 1985, 1ST P INT S SIL MOL, P385
[6]  
BEAN JC, 1985, 1ST P INT S SI MOL B
[7]  
EICHINGER P, 1985, 1ST P INT S SI MBE, P367
[8]  
FIORY AT, J APPL PHYS
[9]   NEW TYPE OF SOURCE GENERATING MISFIT DISLOCATIONS [J].
HAGEN, W ;
STRUNK, H .
APPLIED PHYSICS, 1978, 17 (01) :85-87
[10]   X-RAY-INVESTIGATION OF BORON-DOPED AND GERMANIUM-DOPED SILICON EPITAXIAL LAYERS [J].
HERZOG, HJ ;
CSEPREGI, L ;
SEIDEL, H .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (12) :2969-2974