ION-BEAM PROCESSING FOR COATING MGF2 ONTO AMBIENT-TEMPERATURE SUBSTRATES

被引:37
作者
KENNEMORE, CM
GIBSON, UJ
机构
来源
APPLIED OPTICS | 1984年 / 23卷 / 20期
关键词
D O I
10.1364/AO.23.003608
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
15
引用
收藏
页码:3608 / 3611
页数:4
相关论文
共 15 条
[1]   PHYSICS OF ION PLATING AND ION-BEAM DEPOSITION [J].
AISENBERG, S ;
CHABOT, RW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01) :104-107
[2]   SOME TRENDS IN PREPARING FILM STRUCTURES BY ION-BEAM METHODS [J].
GAUTHERIN, G ;
WEISSMANTEL, C .
THIN SOLID FILMS, 1978, 50 (MAY) :135-144
[3]   REFLECTANCE AND DURABILITY OF AG MIRRORS COATED WITH THIN-LAYERS OF AL2O3 PLUS REACTIVELY DEPOSITED SILICON-OXIDE [J].
HASS, G ;
HEANEY, JB ;
HERZIG, H ;
OSANTOWSKI, JF ;
TRIOLO, JJ .
APPLIED OPTICS, 1975, 14 (11) :2639-2644
[4]   EFFECT OF ION IRRADIATION ON ADHERENCE OF GERMANIUM FILMS [J].
HIRSCH, EH ;
VARGA, IK .
THIN SOLID FILMS, 1978, 52 (03) :445-452
[5]   FORMATION OF TRANSPARENT HEAT MIRRORS BY ION PLATING ONTO AMBIENT-TEMPERATURE SUBSTRATES [J].
HOWSON, RP ;
AVARITSIOTIS, JN ;
RIDGE, MI ;
BISHOP, CA .
THIN SOLID FILMS, 1979, 63 (01) :163-167
[7]  
MACLEOD HA, 1969, THIN FILM OPTICAL FI, P254
[8]   ION-BEAM-ASSISTED DEPOSITION OF THIN-FILMS [J].
MARTIN, PJ ;
MACLEOD, HA ;
NETTERFIELD, RP ;
PACEY, CG ;
SAINTY, WG .
APPLIED OPTICS, 1983, 22 (01) :178-184
[9]   INTERFACE FORMATION DURING THIN FILM DEPOSITION [J].
MATTOX, DM ;
MCDONALD, JE .
JOURNAL OF APPLIED PHYSICS, 1963, 34 (08) :2493-&
[10]   ION-ASSISTED DEPOSITION OF OPTICAL THIN-FILMS - LOW-ENERGY VS HIGH-ENERGY BOMBARDMENT [J].
MCNEIL, JR ;
BARRON, AC ;
WILSON, SR ;
HERRMANN, WC .
APPLIED OPTICS, 1984, 23 (04) :552-559