ATOMIC-STRUCTURE IN SIO2 THIN-FILMS DEPOSITED BY REMOTE PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION

被引：67

作者：

LUCOVSKY, G ^{[1
]}

FITCH, JT ^{[1
]}

TSU, DV ^{[1
]}

KIM, SS ^{[1
]}

机构：

[1] N CAROLINA STATE UNIV,DEPT MAT SCI & ENGN,RALEIGH,NC 27695

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.576242

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1136 / 1144

页数：9

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