OPTICAL CHARACTERIZATION OF CONTINUOUS COMPOSITIONAL GRADIENTS IN THIN-FILMS BY REAL-TIME SPECTROSCOPIC ELLIPSOMETRY

被引：36

作者：

KIM, S ^{[1
]}

COLLINS, RW ^{[1
]}

机构：

[1] PENN STATE UNIV,MAT RES LAB,UNIVERSITY PK,PA 16802

来源：

APPLIED PHYSICS LETTERS | 1995年 / 67卷 / 20期

关键词：

D O I：

10.1063/1.114935

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

An analysis procedure for real time spectroscopic ellipsometry data is described that allows one to characterize compositional gradients in thin films prepared by continuously varying the deposition parameters. This approach provides the time evolution of (i) the instantaneous deposition rate, (ii) the surface roughness layer thickness, and (iii) the near-surface dielectric function and composition of the film with a depth resolution as high as 7 Angstrom. We apply the analysis to obtain the depth profile of the relative void volume fraction for an amorphous silicon-carbon alloy film prepared by plasma-enhanced chemical vapor deposition. (C) 1995 American Institute of Physics.

引用

页码：3010 / 3012

页数：3

共 10 条

[1]

Aspnes D. E., 1981, Proceedings of the Society of Photo-Optical Instrumentation Engineers, V276, P188

[2] GROWTH OF ALXGA1-XAS PARABOLIC QUANTUM-WELLS BY REAL-TIME FEEDBACK-CONTROL OF COMPOSITION [J].