REACTIVELY MAGNETRON SPUTTERED HF-N FILMS .1. COMPOSITION AND STRUCTURE

被引：52

作者：

JOHANSSON, BO

HELMERSSON, U

HIBBS, MK

SUNDGREN, JE

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 58卷 / 08期

关键词：

D O I：

10.1063/1.335812

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3104 / 3111

页数：8

共 30 条

[1] SOME PROPERTIES OF RF-SPUTTERED HAFNIUM NITRIDE COATINGS [J].

ARON, PR ;

GRILL, A .

THIN SOLID FILMS, 1982, 96 (01) :87-91

[2]

BILLY M, 1973, B SOC CHIM FR, V5, P1537

[3] RF-SPUTTERED SILICON AND HAFNIUM NITRIDES - PROPERTIES AND ADHESION TO 440C STAINLESS-STEEL [J].

GRILL, A ;

ARON, PR .

THIN SOLID FILMS, 1983, 108 (02) :173-180

[4]

HOLLECK H, 1981, KFK3087B KERNF ZENTR

[5] STRUCTURE OF REACTIVELY MAGNETRON SPUTTERED HF-N FILMS [J].

JOHANSSON, BO ;

SUNDGREN, JE ;

HELMERSSON, U ;

HIBBS, MK .

APPLIED PHYSICS LETTERS, 1984, 44 (07) :670-672

[6]

JOHANSSON BO, 1984, THESIS LINKOPING U S

[7]

JOHANSSON BO, UNPUB J VAC SCI TECH

[8]

Klug H. P., 1974, XRAY DIFFRACTION PRO

[9]

Klug HP., 1974, XRAY DIFFRACTION PRO, V2, P635

[10]

KODAMA M, 1978, THIN SOLID FILMS, V54, P353, DOI 10.1016/0040-6090(78)90397-8

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