RF-SPUTTERED SILICON AND HAFNIUM NITRIDES - PROPERTIES AND ADHESION TO 440C STAINLESS-STEEL

[1] ANGUS HC, 1962, T I MET FINISH, V39, P30

[2] SOME PROPERTIES OF RF-SPUTTERED HAFNIUM NITRIDE COATINGS [J]. THIN SOLID FILMS, 1982, 96 (01) : 87 - 91

[3] BRAINARD WA, 1978, NASA TM78895 TECH ME

[4] THEORETICAL ASSESSMENTS OF MAJOR PHYSICAL PROCESSES INVOLVED IN THE DEPTH RESOLUTION IN SPUTTER PROFILING [J]. RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1982, 62 (3-4): : 119 - 152

[5] NITRIDATION OF SILICON (111) - AUGER AND LEED RESULTS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (01): : 517 - 520

[6] SPUTTERED SILICON-NITRIDE COATINGS FOR WEAR PROTECTION [J]. THIN SOLID FILMS, 1982, 96 (01) : 25 - 30

[7] PLASMA SI NITRIDE - A PROMISING DIELECTRIC TO ACHIEVE HIGH-QUALITY SILICON MIS-IL SOLAR-CELLS [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (04) : 3076 - 3079

[8] KODAMA M, 1978, THIN SOLID FILMS, V54, P353, DOI 10.1016/0040-6090(78)90397-8

[9] MCGUIRE GE, 1979, AUGER ELECTRON SPECT

[10] MIYOSHI K, 1982, NASA1991 TECH PAP

[1] ANGUS HC, 1962, T I MET FINISH, V39, P30

[2] SOME PROPERTIES OF RF-SPUTTERED HAFNIUM NITRIDE COATINGS [J]. THIN SOLID FILMS, 1982, 96 (01) : 87 - 91

[3] BRAINARD WA, 1978, NASA TM78895 TECH ME

[4] THEORETICAL ASSESSMENTS OF MAJOR PHYSICAL PROCESSES INVOLVED IN THE DEPTH RESOLUTION IN SPUTTER PROFILING [J]. RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1982, 62 (3-4): : 119 - 152

[5] NITRIDATION OF SILICON (111) - AUGER AND LEED RESULTS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (01): : 517 - 520

[6] SPUTTERED SILICON-NITRIDE COATINGS FOR WEAR PROTECTION [J]. THIN SOLID FILMS, 1982, 96 (01) : 25 - 30

[7] PLASMA SI NITRIDE - A PROMISING DIELECTRIC TO ACHIEVE HIGH-QUALITY SILICON MIS-IL SOLAR-CELLS [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (04) : 3076 - 3079

[8] KODAMA M, 1978, THIN SOLID FILMS, V54, P353, DOI 10.1016/0040-6090(78)90397-8

[9] MCGUIRE GE, 1979, AUGER ELECTRON SPECT

[10] MIYOSHI K, 1982, NASA1991 TECH PAP