SUBSTRATE-TEMPERATURE EFFECT ON CRYSTALLOGRAPHIC QUALITY AND SURFACE-MORPHOLOGY OF ZINC-SULFIDE FILMS ON (100)-ORIENTED SILICON SUBSTRATES BY MOLECULAR-BEAM EPITAXY

被引：12

作者：

YOKOYAMA, M

KASHIRO, K

OHTA, S

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 60卷 / 10期

关键词：

D O I：

10.1063/1.337602

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：3508 / 3511

页数：4

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