GROWTH-CONTROL OF INAS THIN-LAYERS ON GAAS SUBSTRATES WITH SEVERAL ORIENTATIONS

被引:5
作者
LEE, JS
SHIMA, T
KUDO, K
TANAKA, K
NIKI, S
YAMADA, A
MAKITA, Y
机构
[1] CHIBA UNIV,FAC ENGN,INAGE KU,CHIBA 263,JAPAN
[2] ELECTROTECH LAB,TSUKUBA,IBARAKI 305,JAPAN
关键词
D O I
10.1016/0169-4332(94)90172-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Surface morphologies and photoluminescence (PL) spectra of the InAs/GaAs thin layer structures show the obvious dependence on substrate orientation. In addition, the structures grown on non-(100) substrates show a strong dependence on flux ratio, InAs layer thickness, and growth temperature. In particular, PL spectra and surface morphologies of (211)A specimens grown under several conditions show not only quantum well (QW) features but also three-dimensional microstructure ones. The results suggest that well defined layer-by-layer growth and three-dimensional growth can be controlled by changing the V/III flux ratio and growth temperature.
引用
收藏
页码:279 / 284
页数:6
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