INVESTIGATION OF HIGH-RATE MAGNETRON SPUTTERING OF NIOBIUM FILMS FOR JOSEPHSON INTEGRATED-CIRCUITS

被引：15

作者：

VILLEGIER, JC

VELER, JC

机构：

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1983年 / 19卷 / 03期

关键词：

D O I：

10.1109/TMAG.1983.1062556

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：946 / 950

页数：5

共 28 条

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[5]

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JOURNAL OF APPLIED PHYSICS, 1980, 51 (08) :4460-4470

[10] MODEL OF BIAS SPUTTERING APPLIED TO CONTROL OF NB FILM PROPERTIES [J].

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