INVESTIGATION OF THE DEPENDENCE OF REACTIVE ION ETCHING OF AL-SI-CU ALLOYS UPON FILM DEPOSITION CHARACTERISTICS

被引：4

作者：

MALEHAM, J

机构：

来源：

关键词：

D O I：

10.1016/0042-207X(84)90080-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：437 / 444

页数：8

共 39 条

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